iCVD

i-CVD (initiated Chemical Vapor Deposition) is a technology to deposit polymeric thin films through gaseous polymerization reactions by vaporizing volatile monomer and initiator The initiator is decomposed by a high-temperature filament in the chamber to induce a gaseous polymerization reaction of the monomer.
Unlike the traditional polymer thin film deposition using organic solvents, the thin film is very pure because it is a gas phase reaction. Also It can be applied to various types of substrates, especially those that are vulnerable to external mechanical and chemical shocks because i-CVD is a drying process.