iOV EX2
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Writer 관리자 작성일22-05-26 13:38 View488관련링크
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iOV EX2
• (PE) ALD Cluster system
• Reactor size : 8”, 12”
• Showhead type
• Substrate shape : wafer
• Process temperature
(SUS Heater) Max.< 500℃,
(AlN Heater) Max.< 700℃
• Up to 3 sets of metal organic precursor delivery lines
• Up to 1 set of liquid reactant delivery lines
• Up to 4 sets of special gas reactant delivery lines.
• PC base control (iSAC iOV Control Pro TM)
• Automated wafer handling system