iOV MX8 

      • (PE) ALD Cluster system

      • Reactor size : 8” 4 Slot Cluster

      • Showerhead type

      • Substrate shape : wafer

      • Process temperature Max.< 320℃

      • 2 sets of metal organic precusor delivery lines

      • O₃ reactant gas delivery line.

      • Rotational Susceptor

      • PC base control (iSAC iOV Control Pro TM)

      • Automated wafer handling system