iOV DX3
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작성자 관리자 작성일22-05-26 13:35 조회555회관련링크
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iOV DX3
• (PE) ALD system
• Reactor size : 4", 6", 8", 12"
• Substrate shape : wafer or rectangular glass
• Process temperature Max.< 500℃
• 3 sets of metal organic precusor delivery lines
• 1 set of liquid reactant delivery lines
• Up to 4 sets of special gas reactant delivery lines.
• PC base control (iSAC iOV Control Pro TM)
• Automated wafer handing w/LCC