iOV DX3
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작성자 관리자 작성일22-05-26 13:34 조회473회관련링크
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iOV DX3
• (PE)
ALD system
•
Reactor size : 4", 6", 8", 12"
•
Substrate shape : wafer or rectangular glass
•
Process temperature Max.< 500℃
• 3
sets of metal organic precusor
delivery lines
• 1
set of liquid reactant delivery lines
• Up
to 4 sets of special gas reactant delivery lines.
• PC
base control (iSAC iOV
Control Pro TM)
•
Automated wafer handing w/LCC